Apparatus, experimental setups
Deposition aparatus 1 2chamber system of CVD （hot wire chamber，sputter chamber）
Deposition aparatus 2 Rf sputtering machine
4 RIE（Reactive Ion Etching)
CPM system and cryostat
Evaluationg system of wavelength conversion film
CV measurement system
Hall effect measurement system
CFD (Computational Fluid Dynamics) system
Atomic hydrogen flow simulation
Sputtering aparatus with 5-source system; Al, Cr, Mo, SiO2, GGG
Film thickness evaluation system by optical interference method
Solar simulator
Hot pressing machine （5MPa、300℃）
Oven of nitrogen substituent type (40〜300℃)
Muffle furnace (〜1200℃)
Clean draft
Ultra pure water production system
Spectrum Analyser(0.35μm〜1.75μm）
Conductivity meter (10-3〜10-7Ωcｍ)
Resistive heat deposition system
Contact mask aligner